Directory
Do-Heyoung Kim
Professor at Chonnam National University, South Korea
| When |
Jul 12, 2023 à 10:30 AM |
|---|---|
| Where |
André Collet |
| Contact |
Stephan Steinmann |
ATOMIC LAYER DEPOSITION (ALD): Beyond Integrated Circuit Applications
Atomic Layer Deposition (ALD) is a highly useful process for synthesizing functional thin films with thicknesses of about 10 nm or less. Initially, although ALD received little attention due to its slow synthesis rate, it has been successfully adopted as a key process for the fabrication of various Integrated Circuits (ICs) since the early 2000s. Despite its significant advantages, the application of ALD to other industrial fields has not been widely spread. In this presentation, recent advancements in ALD applications in our lab for various fields such as supercapacitors and water splitting will be discussed. Additionally, future perspectives on ALD technology development will be discussed